The assembly of oxide and non-oxide building blocks is essential to myriad applications, including optical devices, sensors, and microelectromechanical systems (MEMS). Progress in these areas has been hindered by the availability of precisely tailored colloidal microcomponents. We have used stop-flow lithograph (SFL) as a method for patterning colloidal building blocks into these controlled structures. By photo-patterning an index-matched system of silica microspheres suspended in a photocureable acrylamide solution, microcomponents are created with high fidelity, at rates that exceed 10³ min-1. The resulting granular bodies are then transformed at elevated temperatures into microcomponents composed of porous or glassy silicon oxide or porous silicon via magnesiothermic reduction. The SFL method provides a route to advancing a wide variety of fields via exquisite control over component size, shape, and composition.