The Pattern Replication In Non-wetting Templates (PRINT¹) technique has been extended to patterning of isolated features as well as embossed films of sub-500 nm "hard" inorganic oxides and "soft" semiconducting polymers including TiO₂, SnO₂, ZnO, ITO, BaTiO₃, poly(3-hexylthiophene) (P3HT), Poly[2-methoxy-5-(3′,7′-dimethyloctyloxy)-1,4-phenylenevinylene] (MDMO-PPV), and other polythiophene derivatives. The low surface energy, chemically resistant, air permeable elastomeric perflouropolyether (PFPE) based molds allow for numerous materials to be patterned on a variety of substrates including glass, transparent conductive oxides, and thin films of conducting polymer for a wide range of electronic and optical applications. PRINT is a unique route that provides for (1) large area arrays of isolated features with uniformity and precise control over shape and size (2) the patterning of materials with large aspect ratios (3) layer by layer deposition without destruction of the first layer and (4) the patterning of an extensive array of materials with amenability to surface functionalization and (5) a cost effective fabrication process that is scalable for roll-to-roll manufacturing processes. Additionally, we will discuss pattern replication on the sub-100 nm scale for photovoltaic applications.

1. Rolland et al. J. Am. Chem. Soc. 2005, 127, 10096-10100