Replacement lithography uses elevated biases from a scanning tunneling microscopy (STM) tip to incorporate molecules with various functionality into a self-assembled monolayer (SAM) at the nanoscale level. However, only alkanethiol molecules have been employed as the ink or the initial background SAM. Thus, it has become of interest to explore terminal alkynes as an ink or background SAM in replacement lithography on gold. In this study, various terminal alkynes were employed as the ink molecule or the background SAM. Lines of Fc-CΞC-p-C6H4-CΞC that were inserted into a dodecanethiol SAM had widths of roughly 10nm. Under STM these lines had a greater apparent height than the background SAM, but a similar apparent height to lines composed of an ink with a sulfur binding group. Also, the amount of replacement was similar between lines composed of either terminal alkynes or sulfur binding group molecules.