Wednesday, June 18, 2008 - 2:20 PM
Room 7a (McKimmon Conference Center)
501

New MoS2-Based Inclusion Materials

Gary W. Leach and Greg Cetnarowski. Simon Fraser University, Burnaby, BC, Canada

The structure and properties of new MoS2-based inclusion materials are presented. Exfoliation of crystalline MoS2 leads to a suspension of single molecule thick MoS2 layers which are avid adsorbers. Restacking of the MoS2 layers following adsorption leads to new inclusion compounds whose properties depend upon the characteristics of the adsorbed species. We have employed a variety of characterization methods to understand the adsorption and restacking process and to characterize the guest-host and guest-guest interactions in these systems. The hybrid structure retains its layered nature and the properties of the incorporated species. These new inclusion compounds promise unique properties derived from their layered structure and the properties of the interlayer constituents.