We describe the first, successful, partial nanoshaving of octadecyl- and octyl- dimethylmonochlorosilane monolayers on silicon dioxide (SiO2), as well as nanografting of perfluorinated- and amino- silanes on these surfaces, using an atomic force microscopy (AFM) tip. Even partial nanografting of aminosilane patterns can be used for DNA localization or for binding palladium ions to serve as seeds for electroless deposition of copper lines. That is, even the substitution of a small fraction of chemical species at a surface during nanografting primes the interface to allow significant chemical changes to occur in subsequent processing steps. We characterize our surfaces using AFM, X-ray photoelectron spectroscopy, spectroscopic ellipsometry, and contact angle goniometry.