A three-dimensional (3D) photonic crystal that possesses a complete photonic band gap is highly desirable to confine, manipulate and guide photons for a broad range of applications, including low-threshold lasers, light-emitting devices, optical biosensors, and microphotonic devices. Among many methods to fabricate 3D structures, interference (or holographic) lithography is a very promising candidate, which enables rapid production of defect-free 3D crystals over a large area (diameter of 10 mm) with considerable control over both lattice size and symmetry. Here, we discuss the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative-tone and positive-tone photoresists, organic-inorganic hybrids, and hydrogels. Further, we show selective trapping of nanoparticles on the 3D porous structure, which is coated with a thin layer of responsive polymers. It has potential applications in sensors and optical storage.