The fabrication of nanostructures is of great importance for the continued development of nanodevices and molecular electronics. While microfabrication techniques are relatively established, nanometer-scale fabrication methods are still under development. Because the probe tip-surface interaction is confined to the nanoscale, atomic force microscopy (AFM) techniques are becoming increasingly important for the fabrication of nanostructures. In this presentation, we report a new AFM-based soft lithography method called Field-Assisted Nanopatterning (FAN). Using a conventional AFM, FAN controllably patterns solid or liquid organic and inorganic molecules in the air under ambient conditions onto conducting or semi-conducting substrates. The organic and inorganic materials are coated on AFM tips and then deposited onto substrate surfaces when an appropriate threshold tip bias is achieved. To demonstrate the FAN process, we separately coated standard Si AFM tips with [60]fullerene, N-methylpyrrole, poly-3-octylthiophene, meso-tetraphenylporphyrin, manganese dioxide, zinc oxide and magnesium chloride, and then transferred the species onto highly ordered pyrolytic graphite surfaces. We show that the organic and inorganic nanostructures can be patterned quickly and reliably in air under ambient conditions. The deposition process is a field-assisted transfer of the tip-coating materials to the substrate surface. Nearly any pattern can be produced with feature sizes that range from microns to sub-25 nm.