Tuesday, 27 June 2006 - 1:45 PM
Bonanza Room B (John Ascuaga’s Nugget Casino Resort)
176

Advanced SPM imaging in redox condition and nanolithography

Tianwei Jing and Jing-Jiang Yu. Agilent Technology Inc., Tempe, AZ

Atomic Force Microscopy (AFM) has been widely used in surface characterization due to its unprecedented high spatial resolution. Taking advantage of the very strong and localized tip-sample interactions, AFM can also be utilized as a powerful tool to perform the surface nanolithography. Here we will present an AFM-based fabrication method known as nanografting and its use to produce nanostructures with precisely controlled size, geometry, functionality and local environments including under electrochemistry control at the nanometer-scale within a self-assembled monolayer (SAM) surface. Examples of application of nanografting such as positioning of biomolecules on surface, regulation of the lateral heterogeneity of mixed SAMs, and the size-dependent study of physical properties of materials with nanometer scale precision will be presented to demonstrate that AFM lithography provides us a necessary platform for studies in nanotechnology and material science.


Back to New Advances in Scanning Probe Microscopy and Lithography for Nanotechnology and Materials Science (Invited Speakers Only)
Back to The 61st Northwest Regional Meeting (June 25 - 28, 2006)