355 Surface Analysis and Optical Properties of Zr-O-N Thin Films Prepared by Sputter-Deposition

Friday, November 6, 2009
Mezzanine (Camino Real Hotel)
Isaac Fernanadez , Mechanical Engineering, University of Texas at El Paso, El Paso, TX
Angela Campbell, Ph.D. , WPAFB, Dayton, OH
C. Ramana , Department of Mechanical Engineering, The University of Texas at El Paso, El Paso, TX
Zirconium (Zr)-based materials, specifically oxides, nitrides and oxynitrides, with diverse structure, properties and phenomena are interesting materials from fundamental and applied perspective. The optical and electrical characteristics of these materials (referred to Zr-O-N system) are very important for applications such as optical filters, anti-reflections coatings, gate-dielectrics, and protective layers. However, the electronic properties of these materials depend on the growth conditions and surface characteristics.  Therefore, understanding the effect of processing conditions on the physical, chemical and electronic properties is important in order to produce Zr-O-N materials with desired characteristics and properties for a given applications. In the present work, thin films of Zr-O-N compounds were deposited on glass, quartz, and silicon(100) substrates by RF magnetron sputtering.  The fabrication was performed using different flow rates of argon, oxygen, and nitrogen under varying deposition temperature. Atomic force microscopy and spectroscopic ellipsometry measurements were performed in order to evaluate the surface structure and optical constants.  The results indicate that the growth conditions strongly influence the surface morphology and roughness, which in turn influence the optical properties. An attempt has been made to establish a correlation between growth conditions, surface structure evolution and optical properties in Zr-O-N  thin films.
Previous Abstract | Next Abstract >>