274 Growth and Optical Properties of Sputter-Deposited ZrNx Thin Films

Thursday, November 5, 2009: 10:20 AM
Brahma (Camino Real Hotel)
Rama S. Vemuri, Ph.D. Candidate , Mechanical Engineering, University of Texas at El Paso, El Paso, TX
C. Ramana , Department of Mechanical Engineering, The University of Texas at El Paso, El Paso, TX
Transition metal nitrides (TMNs) are widely used as diffusion barriers in microelectronic applications, heat and corrosion resistance coatings. The unique optical properties of ZrNx thin films such as selective spectral range optical transmission and reflection make these materials interesting for application in solar-control windows and optical filters in addition to the traditional electronic and ceramic devices. However, ZrNx thin films can form a wide range of compositions and, hence, the electronic properties. Specifically, the optical properties of ZrNx thin films are strongly dependent on the growth conditions. In present research work, ZrNx films were fabricated using reactive radio frequency magnetron sputter deposition on silicon (100) and quartz substrates. The nitrogen flow ratio in reactive gas mixture was changed from 0-100%.  It was found that the nitrogen flow ration in reactive gas mixture during deposition influence the optical properties of resulting ZrNx films. The band gap was varied from 1.3 to 2.7 eV depending on the nitrogen concentration in the reactive gas mixture. The profiles of refractive index and extinction coefficient were also extracted. Upon comparing transmission and reflectance spectra, it was noticed that the ZrNx have the ability to reflect the IR while absorbing UV spectrum. The results will be presented and discussed.