Tuesday, 24 May 2005: 9:00 AM-11:50 AM

Room 204 (Science & Engineering Resource Center)

Nano and Materials Science (NANO)

Surface and Interface Science I

Surface chemistry is central to a wide variety of industrial technological advances, such as cleaning, passivation and growth on semiconductor surfaces for micro- and opto-electronics, chemical tailoring of surfaces for the catalysis industry, and chemical functionalization for the sensor industry. This symposium will highlight work addressing fundamental issues in these areas.
Organizers:Yves J. Chabal
Theodore E. Madey
Presiders:Yves J. Chabal
Theodore E. Madey
9:00 AM Biochemical Surface Modification of Self Assembeld Monolayers
Susan C. D'Andrea, Alexander Y. Fadeev
9:20 AM Chemical Control of Surface Morphology: Taming Instabilities in Silicon Etching
Melissa A. Hines, Simon P. Garcia, Hailing Bao
10:05 AM Wet chemistry on germanium (100) for high-κ dielectric growth
Sandrine Rivillon, Kenneth A. Bratland, Yves J. Chabal, Fabrice Amy, Antoine Kahn, Marek P. Boleslawski
10:25 AM Silicon Surface Functionalization for High-κ Dielectrics Growth
Yu Wang, Ming-Tsung Ho, Leszek Wielunski, Lyudmila Goncharova, Torgny Gustafsson, Yves Chabal
10:45 AM Buried Interfaces in Thin Molecular Films and Colloids
Hai-Lung Dai
11:30 AM The Potentiometric response during Layer-by-Layer Deposition
Manju Manju, Kalle Levon

Back to The 37th Middle Atlantic Regional Meeting (May 22-25, 2005)